microfab of diodes mesa

Micro- and Nano-scale Fabrication Excellence

Si/III-V Semiconductor platforms · nanoPHAB, Eindhoven, Netherlands

MEMS processing

Nano-MEMS Fabrication

· nanoPHAB, Eindhoven, Netherlands

Photonic crystals metasurfaces

Photonic Crystals Nano-cavities

· nanoPHAB, Eindhoven, Netherlands

Nanowires Growth and MBE/MOVPE Epitaxy

Epitaxial Growth of Nanowires

· nanoPHAB, Eindhoven, Netherlands

Metasurfaces and Metalenses

Metasurfaces Nanofabrication on Si/ III-V/ Glass

· nanoPHAB, Eindhoven, Netherlands

Epitaxial Growth of Semiconductor Heterostructers as Quantum Dots and Multi Quantum Wells

III-V Quantum-Dots and Multi Quantum-Wells Epitaxy

· nanoPHAB, Eindhoven, Netherlands

Photonic integrated Circuits (PIC), Gratins, MMI, Waveguides

Photonic Integrated Circuits, Gratings and Waveguides

· nanoPHAB, Eindhoven, Netherlands

Quantum Dots ultrafast diode nanofabrication

Photonic Ultrafast micro-diode with VCSEL Quantum Dots emitter

· nanoPHAB, Eindhoven, Netherlands

III-V
Active Semiconductor Platform & PICs
Si
Silicon Nano-Photonics, Metasurfaces
SiO2/Si3N4
Glass/Dielectrics NanoTech & Metasurfaces
Metals
Metals Contacts and Plasmonics

The Custom Pure-Play Nanophotonics Foundry

nanoPHAB foundry for custom nanofabrication

nanoPHAB® is a novel pure-play nanophotonics foundry providing micro- and nanofabrication services for a wide range of photonics devices, applications and customers. Born as a spin-off of the Eindhoven University of Technology and supported by the advanced facilities of NanoLab@TU/e, nanoPHAB® efficiently delivers high-quality, cost-effective foundry services to let your ideas and products enter the micro- and nanophotonics market.

With a business-to-business (B2B) model, nanoPHAB® offers R&D and fabrication services to fabless customers — from universities and research institutions to industrial SMEs — seeking reliable realization of custom nanophotonic components and circuits. We design, validate and develop the required fabrication processes at the core of prototypes, demonstrators and series products.

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// FOUNDRY IN ACTION

Your Partner in Nanofabrication

nanoPHAB metasurfaces meta atoms
nanoPHAB plasmonic arrays
nanoPHAB custom plasmonics

// FOUNDRY IN ACTION

Nanofabrication Process Example

// INFRASTRUCTURE & EQUIPMENT

Our Facility

🏛️
nanoPHAB® also operates within the state-of-the-art NanoLab@TU/e — a leading centre in III-V integrated photonics technology in Europe, located at Eindhoven University of Technology. The facility provides a full suite of micro- and nanofabrication equipment , some of which are listed below.
nanoPHAB cleanroom for semiconductor fabrications
Epitaxial Growth usign MBE and MOVCD
// EPITAXY
Multiple MOCVD and MBE Reactors
Metal-organic chemical vapour deposition and molecular Beam Epitaxy for growth of III-V heterostructures as well as Ge/Si with atomic-layer precision on InP, GaAs and Si substrates.
Materials
II/IV/VI (Ge/Si/GaP) and III/V (InP, GaAs, InGaAsP, AlGaAs, AlInP)
Specification
CREATEC. Ask for available epi-growth processes
electron Beam Lithography Raith
// E-BEAM LITHOGRAPHY
Electron Beam Lithography Raith EBPG 5150 (EBL)
Direct-write e-beam patterning at 100keV for sub-10 nm feature resolution, enabling photonic crystals, quantum dot structures and nanogratings.
Resolution
down to 5-10nm resolution at 100keV with EBPG Speed of 52MHz and currents up to 400nA
Write field
520um
Maskless UV Lithography
// UV LITHOGRAPHY
Maskless UV Lithogtraphy in yellow room
Specifications
2 inch up to 4 inch wafers. Minimum feature size 0.6µm, minimum lines and spaces (half pitch) 0.8µm @ 360nm
Resists
AZ, MaN, MiR, SU8,...
Deep UV (DUV) High Throughput Lithography
// DUV LITHOGRAPHY
DUV (195nm) Scanner ASML Pass 5500/1100B
NA=0.75 with 4x demagnification and 100nm minimal critical dimension. Writing field = 26mm x 32mm. Capacity ~ 30-40 wafers/hour. Overlay accuracy ~ 20 nm.
Specifications
WARNING: Allowed Wafer Thickness between 300um and 700um and Total Thickness Variation lower than 2-4um.
Resists
BARC, TARC with only positive resisit 200nm max thickness
UV Contact Mask Lithography
// UV LITHOGRAPHY
UV contact Mask Lithogtraphy in yellow room
Wafer Size
2 inch to 4 inch. Top(Back) side Alignment accuracy ~ 5(15) um
Resists
AZ, MaN, MiR, SU8,...
UV Contact Mask Lithography
// DIELECTRICS DEPOSITION
PECVD and ICP-PECVD Systems for Dielectric Depositions
Plasma-enhanced CVD of SiO2, Si3N4, a-Si dielectric layers for metasurfaces, waveguide cladding, passivation, isolation and anti-reflection coatings.
Materials
SiO2 between 10 nm to 10 um. Si3N4 between 10 nm and 600 nm. a-Si between 10 nm and 600 nm
Temperature range
80 C, 150 C and 300 C processes. Ask for more information
EBEAM Metal Evaporators CVD
// METALS DEPOSITION
Multi metal evaporators and sputtering tools
e-Beam evaporators Temscal FC2000 (CVD)
Materials
Ni,Cr,Ti,Ge,Ag,Al,Au,Pt,...
Specification
from 3 nm up to 500 nm with ~3% deposition tolerance.
ICP-RIE Plasma Etcher for Anisotropic Semiconductor Patterning
// ETCHING
ICP-RIE System
Inductively coupled plasma reactive ion etching for precise patterning of III-V, silicon and dielectric photonic waveguide structures.
Process gases
Add info here
Etch depth control
Add specification here
Scanning Electron Microscope Jeol JSM-IT810
// IMAGING & ANALYSIS
Scanning Electron Microscope Jeol JSM-IT810 (SEM)
High-resolution imaging and characterization of nanoscale structures down to 1 nm resolution. Used for process control and quality inspection of photonic devices.
Resolution
Down to less than 1nm
Manufacturer
JEOL JSM-IT810
Reflectometer Thickness Measurement
// CHARACTERIZATION
Optical Reflectometer Measurement Setup
Reflectometer optical characterization of semiconductor, metal and dielectric thicknesses.
Try this 1D Rreflectance Calculator
Brand
Filmetrics (KLA)
Measurement
Layer thickness characterization
Profilometer setup for step height verification
// CHARACTERIZATION
Bruker DekTak XT Profilometer setup
During processing, plasma and chemical wet etching step are validated using profilometer characterization.
Model
Bruker DekTak XT
Measurement
Step height verification between 5nm to 50um
Atomic Force Microscope (AFM)
// CHARACTERIZATION
Atomic Force Microscope (AFM) for nano-patterns characterization
High-resolution scanning probe technique to map 3D surface topography and properties at the nanoscale, achieving sub-nanometer vertical resolution.
Model
Bruker Icon AFM
Measurement
Step height verification between 0.5nm to 5000nm on a maximum area of 500um x 500um
A full list of the equipment at the NanoLab@TUe can be found here

// PROCESS FLOWS · MATERIAL PLATFORMS · FABRICATION

Foundry Services

Material Platforms

🟢
III-V
InP, InGaAs, InGaAsP, AlInAs,
GaAs, AlGaAs, InAs,
Integrated Photonics
Metasurfaces
⬜
Silicon
Si photonics
Metasurfaces & DOE
💎
SiO/SiN/a-Si
Dielectrics/Glass Photonics
Anti-Reflection Coatings
Insulation/Passivation
Metasurfaces
🟨
Metals
Plasmonics and RF
Ti, Cr, Ni, Ge
Al, Ag, Au, Pt
🫧
Polymers
CSAR, ZEP, PMMA, HSQ,
AZ, MaN, MiR, HPR, SU8,
BCB, Polyamide, PDMS, ...
🔘
III-V/Si
Heterogeneous integration III-V/Si
Clean room fabrication process development and validation
// PROCESS FLOW
Process Design - Development - Optimization & Feasibility Analysis
Customer-specific process design and feasibility analysis. We evaluate requirements and propose optimal fabrication flows, reducing time-to-prototype and managing technical risks.
III-VSiDielectricsGlassMetals
Photonic integrated circuit (PIC)
// MICRO-/NANO-FABRICATION
Integrated Photonic Device Fabrication
Fabrication of photonic integrated devices such as Photonic Crystals, Gratings, MMI, Ridge/Slab Waveguides, SOI, Photo-Detectors, Lasers, in III-V and silicon. EBL patterning with ICP-RIE etching and selective sacrificial etching enables sub-100 nm feature sizes and high-Q resonators even on suspended membranes.
InPGaAsSiEBLICP-RIE
Difractive Optical Elements, Sensors, Opto-electronic devices
// MICROFABRICATION
Electro-optical Device Fabrication
Fabrication of ridge and deeply etched waveguides in III-V heterostructures and Dielectrics for integrated photonic circuits including lasers, modulators, amplifiers and passive routing.

Design and Fabrication of Diffractive Optical Element (DOE) devices such as Gratings, Holographic plates, Fresnel Zone Plates, Photon-Sieve, Axicons,...

Ohmic metal contacts optimization for low Resisitance high speed RF modulation and detection.
InPGaAsSiGlassDielectricsMetalsICP-RIE
Photonic crystals and metasurfaces
// NANOFABRICATION
Quantum Photonics Device Fabrication
Specialized processing for quantum applications involving semiconductor heterostructures and dot-based single photon emitters and entangled photon sources. Process flows tailored to maintain quantum coherence and minimize surface recombination.
GaAsInPQuantumCryogenic
Metasurfaces, metalenses and plasmonics
// NANOPHOTONICS
Fabrication of Metasurface, Plasmonics for nanophotonics applications.
Specialized nanofabrication processing on multiple semiconductor and dieletric platform for the fabrication of high aspect-ratio meta-optics devices.
Master and Stamp production for high volume Nano-Imprint Lithography (NIL) replications.
MetasurfacesNanoPhotonisPlasmonicsIII-V/SiGlassNIL
Metasurfaces, metalenses and plasmonics
// R&D SERVICE
Prototype & Series Fabrication
From single-run prototype to small series production. Scalable capacity, process repeatability documentation and full lot traceability for R&D and pre-commercial deliverables.
PrototypeSmall SeriesPilot-lines

// GET IN TOUCH

Contact Us

↑ De Groene Loper 3 · 5612 AE Eindhoven · The Netherlands

📍
Address
nanoPHAB B.V.
De Groene Loper 3
5612 AE Eindhoven
The Netherlands
✉️
General Enquiries
info@nanophab.com
🌐
// PROJECTS

// R&D COLLABORATIONS & INNOVATION

Our Projects

nanoPHAB® actively collaborates with academic institutions, research centres and industrial partners to develop novel nanophotonic technologies, scale up fabrication processes and bring new devices from lab to market. Add your projects below.

🔬
// ACTIVE PROJECT
Project Name — Add Title Here
Brief description of the project scope, objectives and nanoPHAB's role. Add technology area, funding source and expected outcomes.
Partners: Add partner names here
🟢 Ongoing
⚙️
// TECHNOLOGY DEVELOPMENT
Project Name — Add Title Here
Brief description of the project scope, objectives and nanoPHAB's role. Add technology area, funding source and expected outcomes.
Partners: Add partner names here
🟢 Ongoing
🏭
// SCALE-UP & INDUSTRIALIZATION
Project Name — Add Title Here
Brief description of the project scope, objectives and nanoPHAB's role. Add technology area, funding source and expected outcomes.
Partners: Add partner names here
🔵 Completed
// TECHNOLOGIES & PRODUCTS

// PRODUCTS & COMMERCIAL DEVICES

Our Technologies

nanoPHAB® commercialises proprietary nanophotonic devices and technology platforms. Select a product and place your order — we confirm availability and lead time within 2 business days.

🔷
// DEVICE
Product Name — Add Here
Short product description. Specifications, material platform, typical application and available configurations.
€ 0.00 / unit · ex VAT
💡
// TECHNOLOGY LICENSE
Technology Name — Add Here
Description of the technology or license. Include platform, IP status and licensing terms summary.
Contact us for pricing
🧪
// SAMPLE / PROTOTYPE
Sample Name — Add Here
Calibration sample, reference device or prototype kit. Include dimensions, substrate, available quantities.
€ 0.00 / sample kit · ex VAT
// EXTRA

// TO BE DECIDED

Extra

This section is reserved for future content. Edit the HTML inside #xpage-extra to add your content here.

Place an Order

Bank: ABN AMRO  |  IBAN: NL61ABNA0508718678  |  BIC: ABNANL2A
Beneficiary: nanoPHAB B.V.  |  Reference: your order email

Your request is sent to info@nanophab.com. nanoPHAB will confirm availability, price and lead time within 2 business days. Card/PayPal payment links are provided on confirmation.