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nanoPHAB® is the novel pure-play foundry offering specialized foundry services for the development of research and commercial micro- and nanophotonics products mainly based on III-V,Si and Nitrides nanotechnologies.

Using the facilities of NanoLab@TU/e, our services consist of the micro- and nano-fabrication of integrated and scalable photonic components and circuits based on III-V heterostructures, and include:

 

Process design and feasibility analysis based on the customer’s specifications    

 

Epitaxial growth of nanostructures as III-V heterostructures (mainly based on InP and GaAs) and nanowires by Metal Organic Vapor Phase Epitaxy (MOVPE) and Molecular Beam Epitaxy (MBE)     

 

Nanofabrication processing including  sputtering, plasma-enhanced chemical vapor deposition (PECVD), E-beam lithography, nanoimprint lithography, UV and DUV lithography, reactive ion etching (RIE), inductively coupled plasma (ICP) etching, thermal and E-beam evaporation of metals for ohmic contacts, bonding to silicon and wet chemical etching (see a list of our main equipment)    

 

We additionally offer access to a number of key R&D nanophotonics technologies developed within the COBRA Research Institute

 

Download our Brochure for a quick overview of our services

 

 

The video below shows some of our main foundry services to fabricate a typical nanophotonic device for NIR and ultrafast electro-optical operation

 

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